Speaker
Songdan Kang
Description
Metal-assisted chemical etching (MacEtch) is a novel nanofabrication method which can be used to produce high aspect ratio semiconductor nanostructures. In the MacEtch process, semiconductors patterned with noble metals (e.g., Ag, Au and Pt) which act as a catalyst are dipped into etching solution mixed with oxidant (e.g., H2O2) and acidic (e.g., HF). In this work, we investigate the formation of GaP nanostructures etched in the solution of KMnO4 and HF by using the method of MacEtch.
Primary author
Songdan Kang
Co-author
Dr
Fariba Hatami
